YBaCuO thin film deposition by pulsed plasma discharges

机译：脉冲等离子体放电沉积YBaCuO薄膜

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A pulsed arc plasma discharge and off-axis magnetron sputtering were used to sputter YBa/sub 2/Cu/sub 3/O/sub 7-x/ bulk targets and deposit YBaCuO thin films on MgO

机译：使用脉冲电弧等离子体放电和离轴磁控溅射来溅射YBa / sub 2 / Cu / sub 3 / O / sub 7-x /块状靶，并在MgO上沉积YBaCuO薄膜

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《Industry Applications Society Annual Meeting, 1993., Conference Record of the 1993 IEEE》|1993年|P.1792-1795|共4页
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Suda Y.; Nakazono T.; Ebihara K.;
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中图分类无线电电子学、电信技术;
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机译：通过辉光放电等离子体通过基于等离子体的离子注入沉积碳膜，该辉光放电等离子体由施加到基板的高压脉冲激发
4. YBaCuO thin film deposition by pulsed plasma discharges [C] . Suda Y., Nakazono T., Institute of Electric and Electronic Engineer IEEE Industry Applications Society Annual Meeting . 1993

机译：脉冲等离子体放电ybacuo薄膜沉积
5. Ultra-thin boron nitride films by pulsed laser deposition: Plasma diagnostics, synthesis, and device transport [D] . Glavin, Nicholas Robert 2016

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6. Tribological and thermal stability study of nanoporous amorphous boron carbide films prepared by pulsed plasma chemical vapor deposition [O] . Shahira Liza, Naoto Ohtake, Hiroki Akasaka, 2015

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7. Characteristics of a Pulsed Plasma Process and YBaCuO Thin Film Deposition [O] . Kenji Ebihara, Toshiyuki Matsumoto, Tomoaki Ikegami, 1991

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8. Influence of pulse width and target density on pulsed laser deposition of thin YBaCuO film [R] . Vikram, S. 1999

机译：脉冲宽度和目标密度对薄YBaCuO薄膜脉冲激光沉积的影响

YBaCuO thin film deposition by pulsed plasma discharges

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