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NEW STRATEGIES IN EPMA TO ANALYSE FINE STRUCTURES USING MONTE CARLO BASED RECONSTRUCTION TECHNIQUES

机译:EPMA中的新策略,可使用基于蒙特卡洛的重建技术来分析精细结构

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Electron probe microanalysis (EPMA) is a well-established technique in microbeam and surface layer analysis. Varying the beam energy is a common method used for the analysis of laterally homogeneous multi-layered structures in EPMA. With increasing beam energy, the information depth is increasing as well. Thus, the multi beam energy acquisition delivers a possibility for depth profiling [1], On the other side, cross-section measurements are often performed at one single beam energy. This guarantees stable conditions like well-adjusted focus, astigmatism and gun alignment. With the introduction of the field emission electron microprobes the analysis of submicron features has become of more and more interest due to better focussing capabilities. Since the spatial resolution is then mainly determined by the broadening of the beam due to scattering events within the specimen, a common solution is to apply low voltage analysis, i.e., the use of one single low beam energy. However, as shown in [2], low voltage analysis has its limitations, if soft X-ray lines, i.e., La-lines of the first-row transition elements, are used.
机译:电子探针微分析(EPMA)是在微束和表面层分析中公认的技术。改变束能量是分析EPMA中横向均质多层结构的常用方法。随着束能量的增加,信息深度也在增加。因此,多束能量的采集提供了深度剖析的可能性[1]。另一方面,横截面测量通常是在一个单束能量下进行的。这样可以保证稳定的条件,例如调整好焦点,散光和对准枪。随着场发射电子微探针的引入,由于更好的聚焦能力,对亚微米特征的分析已引起越来越多的关注。由于空间分辨率主要取决于样品中散射事件引起的电子束的展宽,因此通常的解决方案是应用低电压分析,即使用单个低电子束能量。但是,如[2]所示,如果使用软X射线线,即第一行过渡元件的La线,则低电压分析有其局限性。

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