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Plasma Probe Measurement Control System Design

机译:等离子探针测量控制系统设计

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This paper studies the design scheme for the plasma probe measurement control circuit system. MSP430 SCM is employed as the control chip. The design uses two-stage amplification of the voltage outputted by DA and collects segmented and precise scanning voltage at the PA94 output end of the high-voltage operational amplifier. Finally, the voltage and current at both ends of the probe are AD-collected. The collected voltage and current measurement data are amplified by the secondary operational amplifier respectively, and then transmitted to the computer through the serial port for recording, thereby realizing accurate and precise data measurement on the plasma. (This system has obtained the national utility model patent numbered ZL201721203384.2).
机译:本文研究了等离子体探针测量控制电路系统的设计方案。 MSP430 SCM被用作控制芯片。该设计对DA输出的电压进行了两级放大,并在高压运算放大器的PA94输出端收集分段且精确的扫描电压。最后,对探头两端的电压和电流进行AD采集。采集的电压和电流测量数据分别由次级运算放大器放大,然后通过串行端口传输到计算机进行记录,从而实现对等离子体的精确数据测量。 (该系统已获得编号为ZL201721203384.2的国家实用新型专利)。

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