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Investigations and developments of the new type strongly textured paramagnetic Ni-W substrates with buffer coating TiN for creating the second generation high temperature superconductors

机译:新型纹理型顺磁性Ni-W基材的研究和开发具有缓冲涂层锡,用于产生第二代高温超导体

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As the title implies the article describes novel research regarding the textured paramagnetic substrates for creating 2G HTS coated conductors. It is studied the influence of the deposition time and pressure of nitrogen on the cubic texture formation for paramagnetic Ni - 9.5 at. % W ribbon with TiN buffer coating by using XRD methods. It is observed the difference in the mechanism of coating formation during the deposition of TiN on the front and the back side of the substrate. It is shown that the cubic texture strengthening of the metal tape under influence of the TiN coating. It is also established that the optimization of the conditions of thin TiN layer deposition makes it possible to obtain quasi single crystalline TiN coatings with a cubic texture. These textured Ni - 9.5 at. % W/TiN substrates admit the epitaxial growth of high quality HTS films with high current carrying capacity.
机译:由于标题意味着该物品描述了关于用于产生2G HTS涂覆导体的纹理顺磁性基板的新颖研究。研究了氮气沉积时间和压力对顺磁Ni - 9.5的立方纹理形成的影响。通过使用XRD方法,%W丝带用锡缓冲涂层。观察到在基板的前侧和背面沉积期间涂层形成机制的差异。结果表明,在锡涂层的影响下,金属带的立方纹理强化。还建立了薄锡层沉积条件的优化使得可以获得具有立方纹理的准单晶锡涂层。这些纹理的ni - 9.5。 %W / TIN基板承认具有高电流承载能力的高质量HTS膜的外延生长。

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