Microfabrication techniques for millimeter-wave vacuum electronics

摘要

The principal challenge for creating vacuum electron devices in the millimeter-wave (mmW) frequency range is accurate fabrication of slow-wave circuits and other electromagnetic features with tight tolerance. Ultraviolet Photolithography and Electroforming (UV-LIGA) techniques are presented that allow tight tolerance control for slow wave circuits for the mmW and sub-mmW bands. We show how these techniques were applied at the W- and G-bands.