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Nanometer-scale flatness and reliability investigation of stress-compensated symmetrically-metallized monocrystalline-silicon multi-layer membranes

机译:压力补偿对称金属化单晶 - 硅多层膜的纳米级平坦度和可靠性研究

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This paper demonstrates a very robust and fabrication-parameter insensitive concept of full stress compensation in metallized monocrystalline silicon membranes, by symmetrical metal deposition on both sides of a transfer-bonded silicon membrane, resulting in previously unmatched near-perfectly flat and high-reliability metal-coated membranes. Application examples are high-performance optical mirror devices and quasi-optical tuneable microwave surfaces. The influence of the thickness ratio between the metal films on the two membrane sides are investigated, demonstrating a controllable curvature range from −0.3 mm−1 to 0.1 mm−1 by varying the top to bottom metal thickness ratio from 0.38 to 3.5, using metal thicknesses from 200 nm to 800 nm, and achieving near-zero curvature down to 0.004 mm−1. Extensive reliability tests, up to 100 million cycles, showed no detectable change in curvature, no plastic deformation and good repeatability in analog-mode deflection (within 2.5 %), proving the robustness of this concept of metallized monocrystalline membranes.
机译:本文通过转移粘合的硅膜两侧的对称金属沉积来说明金属化单晶硅膜中全应力补偿的非常稳健和制造的参数不敏感概念,从而导致先前无与伦比的扁平和高可靠性金属涂膜。应用示例是高性能光学镜装置和准光可调微波表面。研究了两个膜侧面上金属膜之间的厚度比的影响,通过变化将可控曲率范围从-0.3mm -1 -1 / sop>达到0.1mm -1 / sup>。从0.38到3.5的顶部到底金属厚度比,使用金属厚度为200nm至800nm,并使近零曲率降至0.004 mm -1 -1 / sop>。广泛的可靠性测试,高达1亿周期,显示出曲率的可检测变化,没有塑性变形和模拟模式偏转的良好可重复性(2.5%以内),证明了金属化单晶膜的概念的鲁棒性。

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