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Comparison of Cadmium Selenide Thin Films Deposited by Chemical Bath and Pulsed DC Sputtering for use in Cadmium Telluride Devices

机译:化学浴和脉冲DC溅射沉积的亚硒酰胺薄膜用于碲化镉装置中的比较

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Cadmium selenide (CdSe) thin films deposited using chemical bath deposition and pulsed DC magnetron sputtering are compared for use in cadmium telluride/selenide (CST) photovoltaic (PV) devices. Full devices were made from the bath and sputtered films using a cadmium chloride (CdCl2) treatment temperature of 425°C, this gave an overall efficiency of 9.3% and 3.2% respectively. Photoluminescence (PL) of the sputtered sample confirmed a bandgap was present of 1.58 eV which suggested poor diffusion at 425°C. A (CdCl2) treatment temperature of 465°C gave a large PL peak at 1.37 eV which corresponds to the bandgap of CST, indicating diffusion was more effective at this temperature.
机译:使用化学浴沉积和脉冲DC磁控溅射沉积的硒化镉(CDSE)薄膜,以用于碲化镉/硒化物(CST)光伏(PV)器件。使用镉氯化镉(CDCL)由浴和溅射膜制成完整装置(CDCl 2 )425℃的处理温度分别为9.3%和3.2%的总效率。溅射样品的光致发光(PL)证实了一个带隙的1.58eV,其表明在425℃下的扩散差。 A(CDCL. 2 )465℃的处理温度在1.37eV下给出了大的PL峰值,其对应于CST的带隙,表示在该温度下更有效。

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