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GIAXD and XPS Characterization of sp~3C Doped SiC Superhard Nanocomposite Film

机译:sp〜3C掺杂SiC超硬纳米复合膜的GIAXD和XPS表征

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The sp~3C doped SiC superhard nanocomposite films had been deposited on stainless steel (SS) substrates at different temperature by electron beam-physical vapor deposition (EB-PVD). The sp~3C doped SiC film was studied by grazing incidence X-ray asymmetry diffraction (GIAXD), and X-ray photoelectron spectroscopy (XPS). The results of GIAXD showed that the sp~3C doped SiC nanocomposite films were not a perfect crystal, which was composed with fine SiC nanocrystals, and a second phase very similar to diamond like carbon (DLC). XPS analysis showed that the excess C existed in the present films changed from diamond into DLC structure from the surface to inner of the films.
机译:通过电子束物理气相沉积(EB-PVD),将sp〜3C掺杂的SiC超硬纳米复合薄膜在不同温度下沉积在不锈钢(SS)衬底上。通过掠入射X射线不对称衍射(GIAXD)和X射线光电子能谱(XPS)研究了掺杂sp〜3C的SiC薄膜。 GIAXD的结果表明,由sp〜3C掺杂的SiC纳米复合膜不是完美的晶体,它由精细的SiC纳米晶体和非常类似于类金刚石碳(DLC)的第二相组成。 XPS分析表明,本发明薄膜中存在的过量C从薄膜的表面到内部从金刚石变为DLC结构。

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