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Orientation effect on the giant stress field induced in a single Ni nanowire by mechanical strain

机译:机械应变对单个Ni纳米线诱导巨应应力场的定向效应

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The change of magnetization (i.e. using the inverse magnetostriction effect) allows to investigate at the nanoscale the effects of thermoelastic and piezoelectric strain of an active track-etched P-PVDF polymer matrix on an electrodeposited single-contacted Ni nanowire (NW). The magnetization state is measured locally by anisotropic magnetoresitance (AMR). The ferromagnetic NW plays thus the role of a mechanical probe that allows the effects of mechanical strain to be characterized and described qualitatively and quantitatively. Due to the inverse magnetostriction, a quasi-disappearance of the AMR signal for a variation of the order of △T ≈ 10 K has been evidenced. The coplanarity of the vectors between the magnetization and the magnetic field is broken. A way of studying the effect of the geometry on such a system, is to fabricate oriented polymer templates. Track-etched polymer membranes were thus irradiated at various angles (α_(irrad)) leading, after electrodeposition, to embedded Ni NWs of different orientations. With cylindrical Ni NW oriented normally to the template surface, the induced stress field in a single Ni NW was found 1000 time higher than the bulk stress field (due to thermal expansion measured on the PVDF). This amplification results in three nanoscopic effects: (1) a stress mismatch between the Ni NW and the membrane, (2) a non-negligible role of the surface tension on Ni NW Young modulus, and (3) the possibility of non-linear stress-strain law. When the Ni NWs are tilted from the polymer template surface normality, the induced stress field is reduced and the amplification phenomenon is less important.
机译:磁化的变化(即,使用逆磁致索效应)允许在纳米级上进行研究热弹性和压电应变在电沉积的单接触的Ni纳米线(NW)上的热弹性和压电菌株的影响。通过各向异性磁阻(AMR)局部地测量磁化状态。因此,铁磁NW允许机械探针的作用,其允许机械菌株的影响特征和定量和定量地描述。由于逆磁致伸缩,已经证明了用于变化的AMR信号的AMR信号的准消失。已经证明了△T≈10k的阶数的变化。磁化和磁场之间的矢量的共面积被破坏。一种研究几何形状对这种系统的影响的方法,是制造定向的聚合物模板。因此,在电沉积之后以各个角度(α_(辐照))照射轨道蚀刻的聚合物膜,以嵌入Ni NiWs的不同取向。对于通常向模板表面定向的圆柱形Ni Ni,发现比散装应力场高1000次(由于在PVDF上测量的热膨胀)高1000次。该扩增导致三个纳米镜效应:(1)Ni NW和膜之间的应力不匹配,(2)表面张力对Ni NW杨氏模量的不可忽略的作用,(3)非线性的可能性应力 - 应力法。当Ni NWS从聚合物模板表面正常倾斜时,诱导的应力场降低并且扩增现象不太重要。

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