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High throughput and fine pitch Cu-Cu interconnection technology for multichip chip-last embedding

机译:高通量和细间距Cu-Cu互连技术,用于多芯片后芯片嵌入

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Ultra-thin packages with embedded actives for high functional density have become strategically important with fast growing market for portable electronics. 3D Packaging Research Center at Georgia Tech is pioneering a chip-last approach for die embedding using adhesively bonded copper bumps to enable ultra-fine pitch chip-to-package interconnections. This paper presents three advancements over the adhesive bonding technology demonstrated previously- 1) A novel method to perform chip-last at panel-level, leading to 10–15× reduction in assembly time per die, 2) Improved 2-step assembly process to achieve simultaneous die embedding and cavity planarization, and 3) Adhesive bonding of high I/O die. To demonstrate high throughput assembly, x-ray and electrical yield results for an 8–10 dies, simultaneously bonded on a 3" × 3" panel with high accuracy have been discussed. The assembly process modification yielded planarization of the gap between the die and cavity wall to <1μm. Electrical yield of adhesively bonded large die with ∼800 I/Os has also been discussed. These technology advancements aim to address some of the key limitations of conventional adhesive based assemblies, thus making chip-last adhesive bonding with low profile copper-to-copper interconnections a robust chip embedding solution for next-generation of highly integrated heterogeneous subsystems.
机译:随着便携式电子市场的快速增长,具有用于高功能密度的嵌入式活性物质的超薄封装在战略上已变得很重要。佐治亚理工学院的3D封装研究中心正在率先采用芯片粘合方法来实现最后一种芯片嵌入方法,该方法使用粘合的铜凸点实现超细间距的芯片到封装互连。本文介绍了先前证明的胶粘技术的三项进步:1)一种在面板级执行芯片倒装的新方法,从而使每个芯片的组装时间减少了10–15倍; 2)改进了两步组装工艺,同时实现管芯嵌入和型腔平面化,以及3)高I / O管芯的粘合。为了演示高通量组装,已经讨论了8-10个模具的X射线和电成品率结果,这些模具同时以高精度粘合在3“×3”面板上。修改装配工艺后,芯片和型腔壁之间的间隙平坦化至<1μm。还讨论了约800 I / O的粘合大芯片的电产量。这些技术进步旨在解决传统基于粘合剂的组件的一些关键局限性,从而使具有薄型铜铜互连的芯片最后粘合剂粘结成为下一代高度集成的异构子系统的强大芯片嵌入解决方案。

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