Research on the Distribution of Electric Field Intensity and Laser Damage Characteristics of Thin Films

摘要

With the development of high power laser technology, laser protection attracts more and more domestic and external researchers' attention. The study on how to increase the laser induce damage threshold (LIDT) of optical films, which is very important, is a breakthrough to improve the capability of laser systems. In the paper, the distribution of electric field intensity and laser damage characteristics of optical films was researched. The electric field distribution with different thickness films were simulated by program. The electric field distribution in the film was calculated by design software (TFCalc). Laser films were prepared by electron beam evaporation technology. The 1064 nm laser was used to investigate laser damage properties of laser films. It was found that the distribution of electric field intensity within film has an obvious influence on the films' anti-laser damage capability. To MgF_2 single-layer film, the smaller field intensity distribution on the thin films' air-film surface contributes to the ability of thin-film laser anti-damage. If the thin films' structure system was designed properly and the parameters selected properly, the higher LIDT films could be obtained, then the capability of optical system can be improved.