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ANALYSIS OF STRESS INTENSITY FACTOR FOR THE CRACKED FILMSUBSTRATE CONFIGURATION

机译:裂纹膜基构型的应力强度因子分析

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This study gives the two problems of a crack in the film oriented perpendicular to the filmsubstrate interface with the crack tip fully within the film and the crack tip fully within the film. Based on Beuth’s theory, three-dimensional model is simplified to plane strain problems, which obtains fracture mechanisms of a cracked film-substrate system by applying the boundary element method, and applies it to evaluate the cracked film-substrate system. It shows that the stress intensity factor(SIF) is affected by the different elastic mismatches and the thickness ratio of the film and the substrate. What’s more, this paper studies the special condition of the film-substrate system, which is the analysis of the fracture of the absence of any elastic mismatch between the film and the substrate.
机译:该研究给出了两个问题,即垂直于膜-基材界面取向的膜中存在裂纹,裂纹尖端完全位于膜内,而裂纹尖端完全位于膜内。根据Beuth的理论,将三维模型简化为平面应变问题,通过应用边界元方法获得破裂的薄膜-基底系统的断裂机理,并将其用于评估破裂的薄膜-基底系统。结果表明,应力强度因子(SIF)受不同的弹性失配和薄膜与基材厚度比的影响。此外,本文研究了薄膜-基底系统的特殊条件,即分析薄膜与基底之间没有任何弹性失配的断裂情况。

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