Laser technology on artworks and antiquities: Fundamental aspects

摘要

In this paper, modeling of photochemical and photomechanical effects that may be induced during laser assisted cleaning of painted artworks using pulsed UV ablation is presented. The examined laser parameters are the wavelength at 248 nm and 193 nm in the nanosecond regime, and the fluence below and above the ablation threshold. The two polymeric substrate models used are PMMA and blends of PMMA and PS. A test case study is presented.