New developments in the field of MF-sputtering with dual magnetron to obtaiin higher productivity for large area coatings

摘要

The introduction of the dual magnetron sputtering technology entered new applcations in the field of large area coatings of glass and plastics. Materials like SiO_2, Si_3N_4 or TiO_2 for antirefective coatings of highe quality low-e systems are now deposited faster than with the standard DC Magnetron Cathode. The successful introduction of the dual mangetron in several coating lines demands further progress towards even higher productivity of the sputtering tool. A second dual mangetron generation was developed with anew magnetric field. The cathode was designed and optimized by focusing on the actively sputtered zone ("race-track") of the target. High target utilization and target life time have been achieved with a large target surface.