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Impact of the forward bias on the radiative recombination efficiency in blue (In,Ga)N/GaN quantum-well diodes with an electron reservoir layer

机译:正偏对具有电子存储层的蓝色(In,Ga)N / GaN量子阱二极管中辐射复合效率的影响

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The temperature dependence of the electroluminescence (EL) spectral intensity between T= 20 and 300 K has been investigated in detail for two blue (In,Ga)N/GaN multiple-quantum-well (MQW) light-emitting diodes (LEDs) without and with an additional n-doped In/sub 0.18/Ga/sub 0.82/N electron reservoir layer (ERL). The radiative recombination efficiency significantly changes, when the additional ERL is introduced. For high injection currents I/sub f/ i.e., large forward bias voltages V/sub f/ a quenching of the EL intensity is observed for T<100 K. Furthermore, the temperature variation of the EL intensity is stronger for the LED without the ERL than for the LED with the ERL. For low I/sub f/, i. e., small V/sub f/, however, no quenching of the EL intensity is observed for both LEDs even below 100 K due to efficient carrier capture. These results imply that the unusual evolution of the EL intensity with T and If is probably caused by variations of the actual potential field distribution due to both internal and external fields, which significantly influence the carrier capture efficiency within the MQW layer.
机译:对于两个没有发光的蓝色(In,Ga)N / GaN多量子阱(MQW)发光二极管(LED),已经详细研究了T = 20和300 K之间电致发光(EL)光谱强度的温度依赖性。以及附加的n掺杂In / sub 0.18 / Ga / sub 0.82 / N电子存储层(ERL)。当引入额外的ERL时,辐射复合效率会发生显着变化。对于高注入电流I / sub f /,即,大的正向偏置电压V / sub f /,对于T <100 K观察到EL强度的猝灭。此外,对于没有LED的LED,EL强度的温度变化更大。 ERL比带有ERL的LED更胜一筹。对于低I / sub f /,i。例如,小V / sub f /,但是由于有效的载流子捕获,甚至对于低于100 K的两个LED都没有观察到EL强度的猝灭。这些结果表明,EL强度随T和If的异常变化可能是由于内部和外部电场造成的实际势场分布变化而引起的,这极大地影响了MQW层内的载流子捕获效率。

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