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A novel synthesis method of large-area tungsten oxide nanowires arrays and their field emission properties

机译:大面积氧化钨纳米线阵列的合成新方法及其场发射特性

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A very simple catalyst-free approach to fabricate tungsten oxide nanowire arrays on large area silicon substrate is reported. A set of tungsten wires is used as tungsten source. Silicon substrates are placed on a holder /spl sim/2 mm beneath the wires. The chamber is pumped to 1 /spl times/ 10/sup -2/ Torr and high purity argon is introduced. The tungsten wires are then heated by passing current through them sequentially. At high temperature, the surface is oxidized by the residual oxygen in the vacuum chamber. As a result, tungsten oxide NW arrays are grown on the silicon substrates. Field emission measurements on these nanowires show turn on field of about 9 MV/m which is defined as the macroscopic field required to produce a current density of 10 /spl mu/A/cm/sup 2/.
机译:报道了一种非常简单的无催化剂的方法来在大面积硅衬底上制造氧化钨纳米线阵列。一组钨丝用作钨源。将硅基板放在电线下方的固定器/ spl sim / 2 mm上。将腔室抽至1 / spl次/ 10 / sup -2 /托,并引入高纯氩气。然后通过使电流顺序流过钨丝来加热它们。在高温下,真空室中的残留氧气会氧化表面。结果,在硅衬底上生长了氧化钨NW阵列。在这些纳米线上的场发射测量显示大约9 MV / m的开启场,这被定义为产生10 / spl mu / A / cm / sup 2 /的电流密度所需的宏观场。

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