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Magneto-Optical Investigation of Thin-Film Magnetic Structures

机译:薄膜磁性结构的磁光研究

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This study reports on the performance of a multilayer film structures which are very prospective material for the thin-film magnetic sensors. The magnetic and magnetooptical (MO) properties of NML/FM bilayers and also FM/NML/FM trilayers (with NML = Mo, Ta; FM = Fe, Co), prepared by using a magnetron sputtering system have been presented. FM layer thickness t_(P_e) and t_(C_o) in trilayers was variable from 25 to 100 A and the nonmagnetic layer (NML) thickness t_(NML) - from 5 to 50 A. In NML/FM samples the nonmagnetic layer thickness was variable from 5 to 1000 A. The measurements were performed on the magneto-optical magnetometer and by using of spectral technique. The dependencies of hysteresis characteristics (the saturation field and the coercivity) of Fe films on NML thickness were found. The dependence of the transverse Kerr effect (TKE) magnitude on t_(F_e) was established. It was shown experimentally that Kerr effect is sensitive to the magnetization up to a certain depth range below the surface of ferromagnetic - the information depth. It was discovered that the in-plane hysteresis characteristic of the trilayers are strongly dependent on t_(NML). So the existence of the exchange coupling between FM layers through NML and its oscillatory behavior (from antiferromagnetic (AF) to ferromagnetic (F) order) were experimentally established. It was found that period AF-F-AF oscillations of exchange coupling is equal to 6-8 A.
机译:这项研究报告了多层膜结构的性能,多层膜结构是薄膜磁传感器的非常有前景的材料。已经提出了通过使用磁控溅射系统制备的NML / FM双层以及FM / NML / FM三层(具有NML = Mo,Ta; FM = Fe,Co)的磁和磁光(MO)特性。三层中的FM层厚度t_(P_e)和t_(C_o)在25到100 A之间变化,非磁性层(NML)的厚度t_(NML)在5到50 A之间变化。在NML / FM样品中,非磁性层厚度为变量从5到1000A。测量在磁光磁力计上进行,并使用频谱技术。发现了铁膜的磁滞特性(饱和场和矫顽力)与NML厚度的关系。建立了横向克尔效应(TKE)大小对t_(F_e)的依赖性。实验表明,克尔效应对铁磁表面以下某个深度范围(信息深度)的磁化敏感。发现三层的面内磁滞特性强烈依赖于t_(NML)。因此,通过实验建立了通过NML的FM层之间交换耦合的存在及其振荡行为(从反铁磁(AF)到铁磁(F))。发现交换耦合的周期AF-F-AF振荡等于6-8A。

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