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OPTIMIZATION AND CONTROL OF GAS FLOWS IN AN RTCVD REACTOR

机译:RTCVD反应器中气流的优化与控制

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摘要

In this work a new method of dynamic gas flow control in a cylindrical symmetric RTCVD reactor is presented. The method is based on real-time holographic interferometry. Optimization and monitoring of gas flows were realized regarding the density of the medium near the substrate assessed through the fringe displacement in the holographic interferograms. The method developed allows to improve the layer uniformity, interface abruptness and thereby to expand the application of RTCVD.
机译:在这项工作中,提出了一种在圆柱对称RTCVD反应器中动态控制气流的新方法。该方法基于实时全息干涉仪。通过全息干涉图中的条纹位移,可以评估和评估气流在基材附近的密度。开发的方法可以提高层的均匀性,界面突变性,从而扩大RTCVD的应用范围。

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