A Mathematical Model for Process Control in Laser Chemical Vapor Deposition

摘要

Laser chemical vapor deposition is a free form technique capable of producing high aspect ratio microstructures of arbitrary shape. The process does not yet have a high resolution required for microfabrication. For this study, we develop a mathematical model that can be used for predicting the scanning pattern of the laser beam on the surface of deposit in order to produce a microstructure with the desired geometry. We demonstrate the applicability of the model by simulating the deposition of a concave microlens using nickel on a graphite substrate.