首页> 外文会议>International Conference on Modeling and Simulation of Microsystems Mar 27-29, 2000, San Diego, CA, USA >Numerical simulation of periodical distribution of antisite defects in irradiated semiconductors
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Numerical simulation of periodical distribution of antisite defects in irradiated semiconductors

机译:辐照半导体中反位缺陷周期性分布的数值模拟

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摘要

A simulation of radiation-induced instability in binary semiconductors, such as GaAs, was fulfilled. The instability is connected with antisite defects accumulated. It was shown that the number of antisite defects in crystal under irradiation can significantly exceed their equilibrium concentration. We have found that the instability with respect to periodical defect distribution appears at some conditions of irradiation. The wavelength of the periodical distribution was estimated as 100 nm - 10 μm depending on crystal parameters.
机译:对诸如GaAs之类的二元半导体中的辐射诱发的不稳定性进行了仿真。不稳定性与积累的反位缺陷有关。结果表明,在辐照下晶体中反位缺陷的数量可以大大超过其平衡浓度。我们发现在某些辐照条件下会出现周期性缺陷分布的不稳定性。取决于晶体参数,周期性分布的波长估计为100nm-10μm。

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