Phase modulated direct UV grating writing technique for ultra-wide spectrum planar Bragg grating fabrication

摘要

Direct UV Grating Writing (DGW) is an attractive technique for fabricating integrated Bragg grating devices in a silica-on-silicon platform. In this work we propose and demonstrate a novel phase modulated DGW method using an Electro-Optical Modulator for planar Bragg grating fabrication that offers improved performance. This new approach has allowed us to construct Bragg gratings with versatile structures such as phase shifts and apodization profiles. Simple uniform gratings, single and multiple phase shifted gratings, apodized gratings and chirped gratings have been made in this method; using grating detuning and this new phase controlled method we have shown that planar Bragg gratings can be written among 700 nm wavelength range on a single chip exclusively using software control.