The pick-up of ion beam etching depth information during micro-fabrication

摘要

Based on scalar quantity diffraction theory, the phase grating of micro-optics structure is studied. The light intensity distribution of diffraction fields is obtained. Results show that the peak position of light intensity moved with the variation of ion beam etching depth. The conclusion can be used in the pick-up of etching depth information during micro-fabrication, and it has important significance in ion beam etching depth' s accurate control.