首页> 外文会议>EPD congress 2004 >ELECTROCHEMICAL ATOMIC FORCE MICROSCOPIC STUDIES ON THE LOCALIZED CORROSION IN SPUTTERED CHROMIUM NITRIDE THIN FILM
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ELECTROCHEMICAL ATOMIC FORCE MICROSCOPIC STUDIES ON THE LOCALIZED CORROSION IN SPUTTERED CHROMIUM NITRIDE THIN FILM

机译:溅射的氮化铬薄膜的局部腐蚀的电化学原子显微镜研究

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Electrochemical atomic force microscopy (ECAFM) has become a useful tool to study the surface properties and reactions of corrosion down to atomic scale. With the aid of electrochemical control, detailed surface morphology changes can be in-situ observed. In this study, the 3.5 wt% sodium chloride aqueous solution was employed to be the corrosive media to investigate the corrosion behavior of a sputtered chromium nitride thin film on Fe-Mn-Al alloy substrate. Insitu time-lapse sequences of images were obtained using the ECAFM. Localized pittings were observed on the thin film surface. The surface roughness increased due to the corrosion reaction. Some corrosion products were observed around and inside the corrosion pit. As long as the CrN film was penetrated by the corrosive electrolyte, the galvanic corrosion of the exposed Fe- Mn-Al alloy substrate dominated the corrosion reaction. An attacked large pit on the CrN thin film and the exposed substrate was found. The eruption of the hydrogen gas along the CrN film and Fe-Mn-Al alloy substrate interface made the cracking and spallation of CrN thin film.
机译:电化学原子力显微镜(ECAFM)已成为研究表面性质和腐蚀反应直至原子尺度的有用工具。借助于电化学控制,可以原位观察详细的表面形态变化。在这项研究中,采用3.5 wt%的氯化钠水溶液作为腐蚀介质,以研究溅射溅射的Fe-Mn-Al合金基底上的氮化铬薄膜的腐蚀行为。使用ECAFM获得图像的原位延时序列。在薄膜表面观察到局部点蚀。由于腐蚀反应,表面粗糙度增加。在腐蚀坑周围和内部观察到一些腐蚀产物。只要CrN膜被腐蚀性电解质穿透,暴露的Fe-Mn-Al合金基底的电化腐蚀就主导了腐蚀反应。在CrN薄膜和裸露的基板上发现了一个侵蚀的大凹坑。氢气沿CrN膜和Fe-Mn-Al合金基底界面的喷发使CrN薄膜开裂和剥落。

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