首页> 外文会议>ELEKTRO, 2012 >Dielectric properties of niobium oxide film and tantalum oxide film at electrolytic niobium and tantalum capacitors
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Dielectric properties of niobium oxide film and tantalum oxide film at electrolytic niobium and tantalum capacitors

机译:电解铌钽电容器上氧化铌膜和氧化钽膜的介电性能

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Complex permittivity of the niobium oxide capacitor 4.7 μF/ 10 Vdc and tantalum oxide 1 μF/ 25 Vdc was measured at room temperature at frequencies from 20 Hz to 2 MHz using the HP (Agilent) E4980A impedance analyzer, with Agilent 16034E 2-terminal test fixture for surface mounted devices (SMD). The real part of the complex permittivity for the niobium oxide capacitor at room temperature is 50 at 20Hz with one dielectric relaxation peak, which was observed at about 10 kHz. Whereas the real part of the complex permittivity for tantalum oxide capacitor at room temperature is 27 at 20Hz with one dielectric relaxation peak, which was observed at about 100 kHz. It has been shown that to be useful to use niobium and tantalum oxide capacitor below 100 kHz for measuring the dielectric properties of niobium and tantalum oxide film.
机译:使用HP(Agilent)E4980A阻抗分析仪,通过Agilent 16034E 2端测试,在室温下以20 Hz至2 MHz的频率测量了4.7μF/ 10 Vdc的氧化铌电容器和1μF/ 25 Vdc的氧化钽的复介电常数用于表面安装设备(SMD)的固定装置。铌氧化物电容器在室温下的复介电常数的实部是20Hz时为50,具有一个介电弛豫峰,在约10 kHz处观察到。而在室温下,氧化钽电容器的复介电常数的实部是20Hz时为27,具有一个介电弛豫峰,在约100 kHz处观察到。已经表明使用低于100kHz的铌和钽氧化物电容器对于测量铌和钽氧化物膜的介电性能是有用的。

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