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Chemistry of δ-SnS: New Tin Monosulfide Polymorph Thin Films from Galvanostatic Electrodeposition

机译:δ-SnS的化学:恒电流电镀法制得的新型单硫化锡多晶型薄膜

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Galvanostatic deposition of tin monosulfide thin films (δ-SnS phase) on transparent conductive glass was studied. Uniform films were deposited in aqueous baths with tartaric acid. Cyclic voltammetry suggested tin-tartrate complexes were crucial to film electrodeposition, suppressing tin metal reduction in favor of sulfur species reduction. X-ray diffraction showed primitive orthorhombic symmetry for δ-SnS (a = 11.380 A, b= 4.029 A, c = 4.837 A). 5-SnS was converted to α-SnS (a = 11.172 A, b = 3.994 A c = 4.311 A) following annealing at ~ 270 ℃ in Ar_((g)). Characterizations of the as-deposited films confirmed 1:1 Sn/S. The 5-SnS structure was consistent over a range of deposition temperatures (50, 70, and 90 ℃). UV/Vis spectrometry confirmed increased disorder in films deposited at 50 ℃. A direct allowed optical band gap transition of lower energy for the 5-SnS phase (1.05 eV) was obtained compared to that for a-SnS (direct, 1.2 eV).
机译:研究了在透明导电玻璃上单硫化锡薄膜(δ-SnS相)的恒电流沉积。将均匀的膜用酒石酸沉积在水浴中。循环伏安法表明酒石酸锡络合物对于薄膜电沉积至关重要,抑制锡金属还原,有利于减少硫。 X射线衍射显示出δ-SnS的原始正交对称性(a = 11.380 A,b = 4.029 A,c = 4.837 A)。在〜270℃的Ar _((g))中退火后,5-SnS转化为α-SnS(a = 11.172 A,b = 3.994 A c = 4.311 A)。沉积膜的特征证实为1:1的Sn / S。 5-SnS结构在一定的沉积温度范围(50、70和90℃)下保持一致。紫外/可见光谱法证实了在50℃下沉积的薄膜无序性增加。与a-SnS相比较(直接1.2 eV),获得了5-SnS相(1.05 eV)具有较低能量的直接允许光带隙跃迁。

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