Materials Research Institute for Sustainable Development,National Institute of Advanced Industrial Science and Technology (AIST) 2266-98 Anagahora Shimoshidami Moriyama-ku Nagoya 463-8650, Japan;
Materials Research Institute for Sustainable Development,National Institute of Advanced Industrial Science and Technology (AIST) 2266-98 Anagahora Shimoshidami Moriyama-ku Nagoya 463-8650, Japan;
Materials Research Institute for Sustainable Development,National Institute of Advanced Industrial Science and Technology (AIST) 2266-98 Anagahora Shimoshidami Moriyama-ku Nagoya 463-8650, Japan;
Materials Research Institute for Sustainable Development,National Institute of Advanced Industrial Science and Technology (AIST) 2266-98 Anagahora Shimoshidami Moriyama-ku Nagoya 463-8650, Japan;
tio_2; porous film; trehalose; sol-gel; photocatalyst;
机译:煅烧温度对EPD法制备的SnO_2 / TiO_2复合薄膜光催化活性的影响
机译:煅烧温度对高阶立方介孔WO_3 / TiO_2薄膜结构性能和光催化活性的影响
机译:煅烧温度对液相沉积TiO_2薄膜表面微观结构和光催化活性的影响
机译:煅烧温度对溶胶-凝胶浸涂法制备的TiO_2和SnO_2 / TiO_2薄膜的微观结构,光催化活性和自清洁性能的影响
机译:含二氧化钛硫醇-烯薄膜的多面体低聚倍半硅氧烷(POSS)的光催化活性和自清洁性能的研究
机译:多孔多晶硅薄膜上Cr掺杂TiO2纳米粒子的光催化活性
机译:煅烧温度对旋转涂层技术制备的TiO2薄膜表面形态和光催化活性的影响