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Optical and Electrical Properties of Large Area SnO_2:F Thin Films by Spray Pyrolysis;

机译:喷雾热解法制备大面积SnO_2:F薄膜的光电性能

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SnO_2:F transparent conductive thin films with the area of 500×500mm~2 were deposited on glass substrates by spray pyrolysis using SnCl_4·5H_2O and HF as the starting material and dopant respectively in methanol. The effects of HF concentration on the crystallized status, microstructures, transmittance, conductivity and low emissivity performances of the films have been studied. The results indicated that when HF content was excessive the solution presented strong acidity and it was difficult to obtain the uniform and dense films. However, when HF content was less, the conductivity of the film was poor. In this paper, The optimal mount of dopant HF was investigated and the molar ratio of Sn to F is 1∶0.5. And also the uniform and dense SnO_2:F transparent conductive oxide thin films can be obtained, whose resistivity reached 6.36×10~(-4)Ω·cm, and the average transmittance in visible region was 80%.The low emissivity of this film was 0.25, which could be used as the Low-E glass.
机译:以SnCl_4·5H_2O和HF分别为起始原料和甲醇掺杂物,通过喷雾热解法在玻璃基板上沉积了面积为500×500mm〜2的SnO_2:F透明导电薄膜。研究了HF浓度对薄膜的结晶状态,微观结构,透射率,电导率和低发射率性能的影响。结果表明,当HF含量过多时,溶液呈现强酸性,难以获得均匀致密的薄膜。然而,当HF含量较少时,膜的导电性差。本文研究了HF的最佳掺杂量,Sn与F的摩尔比为1∶0.5。可以得到均匀,致密的SnO_2:F透明导电氧化物薄膜,其电阻率达到6.36×10〜(-4)Ω·cm,可见光区域的平均透射率为80%。为0.25,可以用作Low-E玻璃。

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