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Optical performance, structure and thermal stability of Al/Zr multilayers working at above 17nm

机译:在17nm以上工作的Al / Zr多层膜的光学性能,结构和热稳定性

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摘要

We report on further development of the optical, structural performances and temporal stability of Al(l%wtSi)/Zr multilayers. The multilayers with variable periods (from 10 to 80) are fitted by four-layer model. Below 40 periods, the surface and interfacial roughnesses are increased with the period numbers, but not decrease the reflectivity of Al(l%wtSi)/Zr multilayers. Above 40 periods, such as 80 periods, the reflectivity is down to 34.7% due to larger roughness and worse interfacial boundary. To improve the reflectivity, we modify some parameters during deposition process. The results in the EUV reflectivity show that the reflectivity of the sample with 40 periods is increased from 41.2% to 48.2%. The temporal stability of Al(l%wtSi)/Zr samples with different annealing temperatures has been observed over 35 days.
机译:我们报告了Al(1%wtSi)/ Zr多层膜的光学,结构性能和时间稳定性的进一步发展。通过四层模型拟合具有可变周期(从10到80)的多层。在40个周期以下,表面粗糙度和界面粗糙度会随着周期数的增加而增加,但不会降低Al(1%wtSi)/ Zr多层膜的反射率。在40个以上的周期(例如80个周期)以上,由于粗糙度更大和界面边界更差,反射率下降至34.7%。为了提高反射率,我们在沉积过程中修改了一些参数。 EUV反射率的结果表明,具有40个周期的样品的反射率从41.2%增加到48.2%。在35天内观察到了具有不同退火温度的Al(1%wtSi)/ Zr样品的时间稳定性。

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  • 来源
  • 会议地点 Prague(CZ)
  • 作者单位

    MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;

    MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;

    MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;

    MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China;

    Changchun Institute of Optics, Fine Mechanics and Physics , China;

    Laboratoire de Chimie Physique - Matiere Rayonnement, UPMC Univ Paris 06, CNRS UMR 7614, 11 rue Pierre et Marie Curie, F-75231 Paris cedex 05, France;

    Laboratoire de Chimie Physique - Matiere Rayonnement, UPMC Univ Paris 06, CNRS UMR 7614, 11 rue Pierre et Marie Curie, F-75231 Paris cedex 05, France;

    Laboratoire de Chimie Physique - Matiere Rayonnement, UPMC Univ Paris 06, CNRS UMR 7614, 11 rue Pierre et Marie Curie, F-75231 Paris cedex 05, France;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Al/Zr multilayers; EUV; reflectivity; thermal stability; interfacial roughness;

    机译:Al / Zr多层EUV;反射率热稳定性;界面粗糙度;

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