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Continuing Adventures in High-Temperature Resistive Emitter Physics Materials

机译:高温电阻发射体物理与材料的持续冒险

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摘要

The next generation of resistively heated emitter pixels will be required to attain MWIR apparent temperatures on the order of 2000K, which will require pixel temperatures on the order of 3000K. Numerical simulations have been carried out to determine the material properties required to support the desired performance. Research has been performed to identify a set of potential materials for fabricating these devices based on materials science, existing thermophysical properties, thermodynamic stability and compatibility with thin film processing.
机译:下一代电阻加热的发射器像素将需要达到2000K量级的MWIR表观温度,而这将需要3000K量级的像素温度。已经进行了数值模拟以确定支持所需性能所需的材料特性。基于材料科学,现有的热物理特性,热力学稳定性以及与薄膜工艺的兼容性,已经进行了研究以识别出一组用于制造这些器件的潜在材料。

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