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Dissociation of thorium oxide on the surface of free surface tungsten

机译:氧化th在自由钨表面上的解离

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摘要

THO_2 doped W is commonly used substance for cathodes of light sources. ThO_2 is present in the bulk, in the grain boundaries and on the free surface of W in form of small particles. In lamp manufacturing various heat treatments in various atmospheres are used affecting the concentration of these particles on the surface. In this paper we studied the dissociation kinetics of ThO_2 on free surface. The novel in situ studies on the cathode performance in high pressure discharge lamps prompted us to re-asses the models explaining the ThO_2 dissociation in thoriated tungsten, by taking into account both the numerical modeling of Selverian and the recent development in modeling of internal oxidation and internal reduction.
机译:THO_2掺杂的W是光源阴极的常用物质。 ThO_2以小颗粒形式存在于W的主体,晶界和自由表面中。在灯的制造中,使用各种气氛中的各种热处理来影响这些颗粒在表面上的浓度。在本文中,我们研究了ThO_2在自由表面上的解离动力学。关于高压放电灯阴极性能的新颖的原位研究促使我们通过考虑Selverian的数值模型以及内部氧化和还原模型的最新发展,重新评估解释了含硫钨中ThO_2离解的模型。内部减少。

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