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Profile coating of KB mirrors at the Advanced Photon Source

机译:在高级光子源处KB镜的轮廓涂层

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For microfocusing x-ray mirrors, an elliptical shape is essential for aberration-free optics. However, it is difficult to polish elliptical mirrors to x-ray quality smoothness. A differential coating method to convert a cylindrical mirror to an elliptical one has been previously reported. The differential coating was obtained by varying the sputter source power over a moving substrate. Here we report a new method of profile coating to achieve the same goal more effectively. In the profile coating, the sputter source power is kept constant, while the substrate is passed over a contoured mask at a constant speed. The mask is placed very close to the substrate (within 1.0 mm) on a shield-can over the sputter gun. Four-inch-diameter Si wafers were coated through a 100-mm-long by 152-mm-wide aperture on the top of the shield-can. The thickness distribution was then obtained using a spectroscopic ellipsometer with computer-controlled X-Y translation stages. A model was developed to fit the measured thickness distribution. The relative thickness weightings are then obtained at every point 1mm apart for the entire open area of the aperture. When the substrate is moving across the shield-can during a deposition, the film thickness is directly proportional to the length of the opening on the can along the moving direction. By equating the summation of relative weighting to the required relative thickness at the same position, the length of the opening at that position can be determined. By repeating the same process for the whole length of the required profile, a contour can be obtained for a desired thickness profile. The contoured mask is then placed on the opening of the shield-can. The number of passes and the moving speed of the substrate are determined according to the required thickness and the growth-rate calibration. The mirror coating profile is determined from the difference between the ideal surface figure of a focus ellipse and the surface figure obtained from a long trace profiler measurement on the substrate. Preliminary test results using Au as a coating material are presented.
机译:对于微聚焦X射线反射镜,椭圆形对于无像差光学器件至关重要。但是,很难将椭圆镜抛光到X射线质量的平滑度。先前已经报道了将圆柱镜转换成椭圆镜的差分涂覆方法。通过改变在移动的基板上的溅射源功率来获得差分涂层。在这里,我们报告了一种新的型材涂覆方法,可以更有效地实现相同的目标。在型材涂层中,溅射源的功率保持恒定,而基板以恒定速度通过仿形掩模。将掩模放在溅射枪上方的屏蔽罩上,非常靠近基材(在1.0毫米内)。通过屏蔽罐顶部的100毫米长乘152毫米宽的孔涂覆直径为4英寸的Si晶片。然后使用具有计算机控制的X-Y平移台的光谱椭圆仪获得厚度分布。开发了适合测得的厚度分布的模型。然后在孔的整个开口区域的相距1mm的每个点处获得相对厚度权重。当在沉积过程中基板在屏蔽罐上移动时,薄膜厚度与罐上沿移动方向的开口长度成正比。通过使相对权重的总和等于相同位置处的所需相对厚度,可以确定该位置处的开口的长度。通过在所需轮廓的整个长度上重复相同的过程,可以获得所需厚度轮廓的轮廓。然后将轮廓遮罩放置在屏蔽罐的开口上。基材的通过次数和移动速度根据所需的厚度和生长速率校准确定。镜面涂层轮廓是根据聚焦椭圆的理想表面图和从对基板进行长时间跟踪轮廓仪测量获得的表面图之间的差异确定的。给出了使用金作为涂层材料的初步测试结果。

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