首页> 外文会议>Conference on Optical Pattern Recognition Ⅻ Apr 19, 2001, Orlando, USA >DETECTION OF TRIPLE JUNCTION PARAMETERS IN MICROSCOPE IMAGES
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DETECTION OF TRIPLE JUNCTION PARAMETERS IN MICROSCOPE IMAGES

机译:显微图像中三重连接参数的检测

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Secondary electron microscope (SEM) images are analyzed in an automatic system to provide material properties for fracture analyses etc. The image processing presently used is summarized and initial results presented. Our new grain boundary (GB) detection and line following algorithms are presented. Line following locates triple junctions (TJs) (points where 3 grains meet). Initial versions of advanced algorithms to calculate TJ angles, reduce false GBs and TJs and select a reduced number of good probe points are advanced using a new noise map. Registration and formation of mosaic images are also addressed.
机译:在自动系统中对二次电子显微镜(SEM)图像进行分析,以提供用于断裂分析等的材料特性。对当前使用的图像处理进行了总结,并给出了初步结果。介绍了我们新的晶界(GB)检测和线跟踪算法。跟随线定位三重结(TJ)(三个晶粒相遇的点)。使用新的噪声图,可以提高计算TJ角度,减少虚假GB和TJ并选择减少数量的良好探测点的高级算法的初始版本。还介绍了镶嵌图像的配准和形成。

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