首页> 外文会议>Conference on Optical Data Storage 2001, Apr 22-25, 2001, Santa Fe, USA >Crystallization of GeSbTe and AgInSbTe under dynamic conditions
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Crystallization of GeSbTe and AgInSbTe under dynamic conditions

机译:动态条件下GeSbTe和AgInSbTe的结晶

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GST and AIST show similarities and differences in crystal structure and dynamic function. Both have high-symmetry crystal structures enabling them to crystallize at fast rates. The amount of amorphous material remaining after crystallization is about the same in both systems, and very small, indicating that most of the alloy in both systems can be completely crystallized. All disks tested showed good erasure at speeds up to at least 6 m/s. At higher speeds GeSbTe materials have a better erase performance than AgInSbTe. Erase times measured on an AgInSbTe disk at 650 nm and 780 nm were the same, indicating that the inherent erase time of a material and stack might not change with a change in laser spot size. Stack structure plays a large role in the quality of erase at different speeds. Under dynamic conditions, GeSbTe materials appear to function by a bulk nucleation crystallization mechanism or a combination of bulk nucleation and edge growth. AglnSbTe materials function by edge growth crystallization at slow speeds and bulk nucleation at high speeds.
机译:GST和AIST在晶体结构和动态功能方面显示出相同点和不同点。两者都具有高对称性的晶体结构,使它们能够快速结晶。结晶后残留的非晶态材料的量在两个系统中大约相同,并且非常小,这表明两个系统中的大多数合金都可以完全结晶。所有测试的磁盘在至少6 m / s的速度下均显示出良好的擦除效果。 GeSbTe材料在更高的速度下具有比AgInSbTe更好的擦除性能。在AgInSbTe磁盘上在650 nm和780 nm处测量的擦除时间是相同的,这表明材料和叠层的固有擦除时间可能不会随激光光斑尺寸的变化而改变。堆栈结构在不同速度的擦除质量中起着重要作用。在动态条件下,GeSbTe材料似乎通过本体成核结晶机制或本体成核和边缘生长的组合起作用。 AglnSbTe材料通过在低速下进行边沿生长结晶和在高速下进行整体成核而发挥作用。

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