Pattern Placement Errors -Application of in-situ interferometer determined Zernike coefficients in determining printed image deviations

摘要

Several ideas have recently been presented which attempt to measure and predict lens aberrations (1, 2, 3, 4) for new los kl (<0.5) imaging systems. Abbreviated sets of Zernike coefficients have been produced and used to predict Across Chip Linewidth Variation (ACLV). Empirical use of the wavefront aberrations can now be used in commercially available lithography simulators to predict pattern distortions and placement errors.