Effect of PEB Exhaust on Resist CD for DUV Process

摘要

In this work, the effect of exhaust condition during Post Exposure Bake (PEB) on the critical dimension (CD) performance has been investigated for different DUV resists. Two kinds of PEB chamber cover designs have been tested to see the influence of exhaust flow on CD. It has been found that cleaning and adjusting of PEB exhaust flow will change the resist CD. To confirm the impact of PEB exhaust condition on production, resists for both lines and contact holes are verified by scanning electron microscope (SEM).