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Enhancement of Infrared Photo-responses of the Schottky Gate Region of an n-AlGaAs/GaAs Heterojunction FET by a Second Light Illumination

机译:通过第二次光照增强n-AlGaAs / GaAs异质结FET的肖特基栅极区域的红外光响应

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Infrared (IR) photo-responses of the Schottky-barrier gate region are investigated in an n-AlGaAs/GaAs field-effect transistor (FET). The photocurrent from the channel region to the gate is strongly enhanced by about 3.4 times when a weak second light having photon energy above the GaAs bandgap illuminates the FET locally. The enhancement effect is independent of the illumination position of the second light, and remains even when the position is far away from the gate region. The experimental results are compared with a theoretical model based on the electron drift and hole diffusion.
机译:在n-AlGaAs / GaAs场效应晶体管(FET)中研究了肖特基势垒栅区的红外(IR)光响应。当具有高于GaAs带隙的光子能量的第二弱光局部照射FET时,从沟道区到栅极的光电流会强烈增强约3.4倍。增强效果与第二光的照射位置无关,并且即使该位置远离栅极区域也保持不变。将实验结果与基于电子漂移和空穴扩散的理论模型进行了比较。

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