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Low Voltage CV Loss in Tantalum Capacitors

机译:钽电容器的低压CV损耗

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摘要

This paper presents evidence that the low voltage CV loss in Ta capacitors is the result of the natural thermal oxide adding to thickness of the anodic oxide of Ta, thereby, increasing the dielectric thickness and decreasing capacitance. The natural thermal oxide is approximately 3.3 nm thick regardless of the powder CV. At increased formation voltage (anodic oxidernthickness) this effect is diminished due to smaller impact of the natural oxide on total oxide thickness. At the same time, at larger formation voltage the effect of high voltage CV loss is observed. It starts at lower formation voltages with finer Ta powders due to their smaller sintered necks and pores between Ta particles.2 In the highest CV/g Ta powders, these two effects become overlapped, which limits the efficiency of these powders.
机译:本文提供的证据表明,Ta电容器中的低压CV损耗是自然热氧化物增加了Ta阳极氧化物厚度的结果,从而增加了电介质厚度并减小了电容。不管粉末CV如何,天然热氧化物的厚度约为3.3nm。在增加的形成电压(阳极氧化厚度)下,由于天然氧化物对总氧化物厚度的影响较小,这种影响会减弱。同时,在较大的形成电压下,观察到高电压CV损耗的影响。由于其较小的烧结颈和Ta颗粒之间的孔,它以较低的形成电压开始于较细的Ta粉末。2在最高CV / g Ta粉末中,这两种作用重叠,从而限制了这些粉末的效率。

著录项

  • 来源
    《CARTS USA 2010》|2010年|p.99-110|共12页
  • 会议地点 New Orleans LA(US);New Orleans LA(US)
  • 作者单位

    Kemet Electronics Corporation, 2835 Kemet Way, Simpsonville, SC 29681;

    Kemet Electronics Corporation, 2835 Kemet Way, Simpsonville, SC 29681;

    Center for Dielectric Study (CDS), Pennsylvania State University,University Park, PA 16802;

    Center for Dielectric Study (CDS), Pennsylvania State University,University Park, PA 16802;

    Cabot Corporation, 157 Concord Road, Billerica, MA 01821;

    et al;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 半导体技术;
  • 关键词

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