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PARAMETERS ASSOCIATED WITH ERRORS IN THE NANOINDENTATION AT LOW LOAD

机译:低负荷下纳米取向误差相关的参数

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摘要

In the nanoindentation at very low load, various parameters give difficulties in estimating mechanical properties. These parameters are the uncertainties of the indenter geometry and limitations including minimum detectable load and surface roughness. The geometrical deviation in the indenter tip shape and surface roughness are key parameters of errors related to measurement of mechanical properties by nanoindentation at very low load. Therefore, in this work, the effect of surface roughness on the indentation hardness was studied for fused silica wafer, fused silica plate and silicon wafer, which have different roughness values one another. To compare the theoretical values with the measured ones, the effect of the indenter tip geometry was studied using the simulation of the finite element analysis (FEA), neglecting other effects, such as indentation size effect (ISE) and surface roughness. As a result, the geometrical deviation in the indenter tip shape was observed to affect the indentation hardness and the contact area at low load. The roughness of specimens is assumed to be related to the scattering of the evaluated indentation hardness.
机译:在非常低的负载下的纳米压痕中,各种参数给估算机械性能带来了困难。这些参数是压头几何形状的不确定性和限制,包括最小的可检测载荷和表面粗糙度。压头尖端形状和表面粗糙度的几何偏差是与在非常低的载荷下通过纳米压痕测量机械性能有关的误差的关键参数。因此,在这项工作中,研究了具有不同粗糙度值的熔融石英晶片,熔融石英板和硅晶片的表面粗糙度对压痕硬度的影响。为了将理论值与实测值进行比较,使用有限元分析(FEA)的模拟研究了压头尖端几何形状的影响,而忽略了其他影响,例如压痕尺寸影响(ISE)和表面粗糙度。结果,观察到压头尖端形状的几何偏差会影响低负荷下的压痕硬度和接触面积。假定样品的粗糙度与评估压痕硬度的散布有关。

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