Ferroelectric AlN ultrathin films prepared by atomic layer epitaxy

摘要

Wurtzite aluminum nitride (AlN) of space group P63mc has long been recognized as a non-ferroelectric material, lackingthe polarization switching ability. This paper reports the induction of ferroelectricity in a single crystalline epitaxial AlNultrathin film with a thickness of 8−10 nm. The ferroelectric AlN epilayer was grown on a single crystalline GaN layer,forming a [0001]-oriented AlN/GaN epitaxial heterostructure with two reversible polar variants: [000-1] and [0001]. TheAlN epilayer exhibited soft ferroelectricity with large switching currents and a polarization value of ～3.0 μCcm-2 duringa 180° polarization switch. The AlN epilayer was prepared by the atomic layer deposition technique at 300 ℃ inconjunction with in-situ atomic layer annealing. The two-dimensional electron gas (2DEG) at the AlN/GaN interfacecould be manipulated by the ferroelectric switching in the AlN epilayer. Strain engineering via lattice mismatch at theAlN/GaN interface was the key to creating a ferroelectric AlN/GaN heterojunction. Based on the reciprocal spacemapping analysis, the AlN ferroelectricity is believed to be stemming from the out-of-plane compressive strain and inplanetensile strain present in the [0001]-oriented AlN epilayer. The discovery of low-temperature prepared, CMOScompatibleAlN ultrathin films with soft ferroelectric characteristics will undoubtedly spur new fundamental and appliedresearch in low-dimensional ferroelectric systems based on the AlN/GaN heterojunction.