Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA;
Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA;
Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA;
Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA;
Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA;
Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA;
Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA;
Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA;
diffraction grating; multilayer; wet anisotropic etch; EUV; soft X-rays; surface morphology; roughening; relaxation; power spectral density;
机译:来自供应压力高达84 bar的光滑和孔型粗糙表面的平板试验的摩擦系数特性
机译:控制在锯齿状基材上共形沉积Mo-Si多层膜的表面迁移率
机译:镜像生长在刚性和柔性衬底上的磁致伸缩Co /(Ag,Cu,Ta)多层的动态磁行为
机译:压力高达84巴的光滑和孔型粗糙粗糙表面的平板试验的摩擦系数行为
机译:离子辐照引起介电基片上金属膜的粗糙化和平滑化。
机译:(001)-和(111)-SrTiO3衬底上生长的多铁性LaFeO3-YMnO3多层膜的显微结构表征
机译:控制锯齿衬底MO-Si多层保形沉积的表面迁移率