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Effect of substrate on crystallization of sol-gel-derived Pb(Zr_(0.52)Ti_(0.48))O_3 thin films by microwave annealing

机译:衬底对溶胶凝胶衍生的Pb(Zr_(0.52)Ti_(0.48))O_3薄膜微波退火结晶的影响

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摘要

Amorphous Pb(Zr_(0.52)Ti_(0.48))O_3 (PZT) thin films were deposited on LaNiO_3 (LNO)/SiO_2/Si and Pt/Ti/SiO_2/Si substrates by a sol-gel method and then crystallized by microwave irradiation in the microwave magnetic field. The crystalline phases and microstructures as well as ferroelectric property of the PZT films were investigated, and the effect of substrate on crystallization of PZT thin films heated by microwave annealing was discussed. The PZT films on LNO/SiO_2/Si substrate show a highly (l00)-preferred orientation, and better ferroelectric property than those on Pt/Ti/SiO_2/Si substrate. The results demonstrated that LNO/SiO_2/Si substrate is advantage for annealine of PZT thin films bv microwave irradiation in the microwave magnetic field.
机译:通过溶胶-凝胶法在LaNiO_3(LNO)/ SiO_2 / Si和Pt / Ti / SiO_2 / Si衬底上沉积非晶态Pb(Zr_(0.52)Ti_(0.48))O_3(PZT)薄膜,然后通过微波辐射使其结晶在微波磁场中。研究了PZT薄膜的晶相,微观结构以及铁电性能,探讨了衬底对微波退火加热的PZT薄膜结晶的影响。与在Pt / Ti / SiO_2 / Si衬底上的PZT薄膜相比,在LNO / SiO_2 / Si衬底上的PZT薄膜具有更高的(100)优先取向,并且具有更好的铁电性能。结果表明,在微波磁场中微波辐照,LNO / SiO_2 / Si衬底是PZT薄膜退火的优势。

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