首页> 外文会议>5th International Symposium on the Characterisation of Porous Solids (COPS-V), Heidelberg, Germany, May 30-June 2, 1999 >Relationship between intrinsic pore-wall corrugation and adsorption hysteresis of N_2, O_2, and Ar on regular mesopores
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Relationship between intrinsic pore-wall corrugation and adsorption hysteresis of N_2, O_2, and Ar on regular mesopores

机译:规则介孔上固有的孔壁波纹与N_2,O_2和Ar的吸附滞后的关系

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摘要

The effects of the pore width on the hysteresis of the adsorption isotherm of N_2, O_2, and Ar on mesoporous silica at 77 K were examined. A new analysis for the adsorption hysteresis was developed using the Saam-Cole theory. The critical thickness difference DELTAl_c(=l_c-l_e) for adsorbed film, which was derived from this anlaysis, was assoicated with the intrinsic mesopore width distribution due to the surface corrugation, giving the theoretical dependence of the adsorption hysteresis on the pore width and adsorbate; the critical pore width for N_2 is about 4 nm and those for O_2 and Ar are about 3 nm, agreeing with the experimental results.
机译:研究了孔宽度对介孔二氧化硅在77 K下N_2,O_2和Ar的吸附等温线滞后的影响。使用Saam-Cole理论开发了一种新的吸附滞后分析。由该分析得出的吸附膜的临界厚度差DELTAl_c(= l_c-l_e)与表面波纹引起的固有中孔宽度分布有关,从而给出了吸附滞后对孔宽度和被吸附物的理论依赖性; N_2的临界孔宽约为4nm,O_2和Ar的临界孔宽约为3nm,与实验结果一致。

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