首页> 外文会议>32nd European Solid-State Device Research Conference (ESSDERC 2002), Sep 24-26, 2002, Firenze, Italy >New Mechanism of Body Charging in Partially Depleted SOI-MOSFETs with Ultra-Thin Gate Oxides
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New Mechanism of Body Charging in Partially Depleted SOI-MOSFETs with Ultra-Thin Gate Oxides

机译:具有超薄栅极氧化物的部分耗尽SOI-MOSFET体充电的新机制

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摘要

The aggressive scaling of the gate oxide leads to direct gate tunneling current, which affects the floating-body effects in partially-depleted SOI MOSFETs. Experiments and simulations show that the gate-to-body current charges the body causing an unexpected 'kink' effect to occur at low drain voltage. This kink results in a second peak of transconductance, whose time-dependent behavior and practical consequences are investigated.
机译:栅极氧化物的过分缩放会导致直接的栅极隧穿电流,这会影响部分耗尽的SOI MOSFET中的浮体效应。实验和模拟表明,栅极到人体的电流会为人体充电,从而在低漏极电压下发生意外的“扭结”效应。这种扭结导致跨导的第二个高峰,研究其随时间变化的行为和实际后果。

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