首页> 外文会议>24th International Conference on The Physics of Semiconductors Jerusalem, Israel August 2-7, 1998 >Modification of 1D ballistic transport using an atomic force microscope
【24h】

Modification of 1D ballistic transport using an atomic force microscope

机译:使用原子力显微镜修改一维弹道运输

获取原文
获取原文并翻译 | 示例

摘要

We have used the scanning charged tip of an Atomic Force Microscope (AFM) to produce images of the conductance variation of a quantised 1D ballistic channel. The channel was formed using electron beam defined 700nm wide split gate surface electrodes over a high mobility GaAs/AlGaAs heterostructure with a two dimensional electron gas (2DEG) 98nm beneath the surface. We operate the AFM at 1.5K and 4.2K in magnetic fields up to 2T to observe several phenomena. With a dc voltage on the AFM tip we have produced conduction images of the tip potential perturbation, as the channel is a sensitive probe of ethe electrostatic potential. We have also performed gate sweeps with the tip at a series of points across the width of the channel. The observed structure in transconductance corresponds to the theoretical electron density for the first three sub-bands. When certain gates were biased near pinch off, stable two level switching was observed in the images. We were able to control the state of the switch with the gate bias and tip position, and so roughly locate the position of switching source. One of the responsible defect systems was located beneath the 2DEG, and due to screening of the tip potential, the image reveals the 1D channel. By asymmetrically biasing the two gate electrodes we have produced images showing a total channel movement of 102nm across the width of the channel, but accompanied by 201nm of movement along the length of the channel which is due to imperfections in the surface electrodes and disorder in the doping layer.
机译:我们使用了原子力显微镜(AFM)的带电扫描针尖来生成量化的一维弹道的电导率变化的图像。沟道是在高迁移率GaAs / AlGaAs异质结构上使用电子束定义的700nm宽的分离栅表面电极形成的,表面以下是二维电子气(2DEG)98nm。我们在高达2T的磁场中以1.5K和4.2K操作AFM,以观察几种现象。通过AFM尖端上的直流电压,我们生成了尖端电势扰动的传导图像,因为通道是静电势的敏感探针。我们还用尖端在整个通道宽度上的一系列点进行了门扫描。观察到的跨导结构对应于前三个子带的理论电子密度。当某些栅极在夹断附近偏置时,在图像中观察到稳定的两级切换。我们能够通过栅极偏置和尖端位置来控制开关的状态,从而大致确定开关源的位置。其中一个负责任的缺陷系统位于2DEG下方,由于屏蔽了尖端电位,因此图像显示了1D通道。通过不对称地偏置两个栅电极,我们得到的图像显示,整个沟道在整个沟道宽度上的移动为102nm,但伴随着沿着沟道长度的201nm的移动,这是由于表面电极的缺陷和电极表面的无序造成的掺杂层。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号