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Surfaces and growth of group-III nitrides

机译:III族氮化物的表面和生长

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摘要

We present a theoretical study of zinc blende and wurtzite GaN surfaces employing density-functional theory calculations. For clean GaN surfaces our results predict novel surface structures that are very different from those found on traditional III-V semiconductors. Adding impurity atoms of the type commonly present in significant concentrations during growth strongly modifies surface reconstructions and significantly reduces surface energies. For example, we find that arsenic has a low solubility and strongly stabilizes the cubic GaN (001) surface, thus making it interesting as a potential surfactant. We have also found that GaN surfaces are very reactive with impurities such as oxygen. Finally, the diffusion of Ga and N adatoms on both the equilibrium and non-equilibrium surfaces is discussed. These results give insight into the fundamental growth mechanisms and allow conclusions concerning optimum growth conditions.
机译:我们使用密度泛函理论计算对锌共混物和纤锌矿型GaN表面进行了理论研究。对于干净的GaN表面,我们的结果预测出新颖的表面结构,与传统的III-V半导体中的表面结构大不相同。添加在生长过程中通常以显着浓度存在的这种类型的杂质原子会极大地改变表面重建并显着降低表面能。例如,我们发现砷具有较低的溶解度,并且可以强烈稳定立方氮化镓(001)表面,因此使其成为潜在的表面活性剂。我们还发现,GaN表面与杂质(例如氧气)具有很高的反应性。最后,讨论了Ga和N原子在平衡和非平衡表面上的扩散。这些结果使人们洞悉了基本的生长机制,并得出了有关最佳生长条件的结论。

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