Metal-Assisted Chemical Etching Method Subjected to Micro/Nano Device Fabrication

摘要

This work presents the metal-assisted chemical etching (MACE) technique along with applications of this technique in microano systems. In this research the MACE technique was used for the fabrication of simple and complex microelectromechanical systems (MEMS) structure such as; micro-cantilever beam and capacitive silicon resonator respectively. Micro-cantilever beam with resonant frequency of 262 kHz and quality factor of 8100 was successfully fabricated. Nano gaps with 250 nm-width and 7 µm-height together with resonator structure have been successfully produced. The resonant peak of the fabricated resonator was found at 81.4 MHz with quality factor of 4000 and motional resistance of 89 kΩ.