首页> 外文会议>2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems amp; Eurosensors XXXIII >Vertically Integrated Multiple Electrode Design for Sensitivity Enhancement of CMOS-MEMS Capacitive Tactile Sensor
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Vertically Integrated Multiple Electrode Design for Sensitivity Enhancement of CMOS-MEMS Capacitive Tactile Sensor

机译:垂直集成多电极设计,用于增强CMOS-MEMS电容式触觉传感器的灵敏度

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This study presents novel capacitive tactile sensor designs with vertically integrated double deformable electrodes array (Fig. 1) based on the standard CMOS platform. The proposed designs have also been implemented by the TSMC 0.18 μm 1P6M standard CMOS process and in-house post-CMOS fabrication. The merits of the presented tactile sensors are as follows, (1) vertically integrating double deformable structures with embedded sensing electrodes (Fig. 1c) by using the multi-stacked thin films of CMOS process; (2) electrically connecting the deformable and fixed electrodes to enhance the initial capacitance C0 and the capacitance change ΔC under the same footprint; (3) discretizing the sensor into a 5×5 sensing unit array to dramatically reduce the warpage of deformable structures introduced by residual stresses; (4) enhancing sensitivity of tactile sensor using the design of deformable structures. Measurement results show a sensitivity of 0.8%/N for the double-membrane design, and 1.4%/N for the membrane-spring design.
机译:这项研究提出了基于标准CMOS平台的垂直集成双可变形电极阵列(图1)的新型电容式触觉传感器设计。拟议的设计还已经通过台积电0.18μm1P6M标准CMOS工艺和内部CMOS后制造工艺实现。所提出的触觉传感器的优点如下:(1)通过使用CMOS工艺的多层薄膜,将双可变形结构与嵌入式感应电极垂直集成(图1c); (2)电连接可变形电极和固定电极以增强初始电容C \ n 0 \ n,并且在相同的占位面积下电容变化ΔC; (3)将传感器离散化为5×5传感单元阵列,以显着减少残余应力导致的可变形结构的翘曲; (4)利用可变形结构的设计来提高触觉传感器的灵敏度。测量结果表明,双膜设计的灵敏度为0.8%/ N,膜弹簧设计的灵敏度为1.4%/ N。

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