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Effects of composition fraction on subthreshold behavior of InAsxSb(1-x) channel UTB MOSFETs

机译:组成分数对InAs x Sb( 1-x )沟道UTB MOSFET亚阈值行为的影响

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In this paper, we report for the first time the effect of composition fraction on the subthreshold behaviour for an n- channel InAsnxnSbn1-xnUTB MOSFET in nanoscale regime. Our model is based on numerical simulation technique using ATLAS, the 2-D device simulator. We have used ATLAS to obtain the drain current InDn, transconductance gnMn, threshold voltage and subthreshold slope taking into account the effect of composition fraction (x). The drain current model is calibrated with reported experimental data. The transfer characteristic curves are utilized to find the threshold voltage and subthreshold slope as a function of composition fraction of InAsxSb1-x channel UTB MOSFETS. Our investigation reveals that composition fraction has a strong impact on the drain current and transconductance in subthreshold and weak inversion region. ON - OFF current ratio as well as subthreshold slope can be improved by changing the composition fraction of InAsnxnSbn1-xnalloy. Also threshold voltage can be shifted by changing the same.
机译:在本文中,我们首次报告了成分分数对n通道InAsn x nSbn 1-x nUTB MOSFET的纳米尺度研究。我们的模型基于使用2D设备模拟器ATLAS的数值模拟技术。我们已经使用ATLAS来获得漏极电流In D n,跨导gn M n,阈值电压和亚阈值斜率考虑了成分分数(x)的影响。用报告的实验数据校准漏极电流模型。利用传输特性曲线来找到阈值电压和亚阈值斜率,该阈值电压和亚阈值斜率是InAsxSb1-x沟道UTB MOSFETS的成分分数的函数。我们的研究表明,在亚阈值和弱反型区域中,组分分数对漏极电流和跨导具有很大的影响。通过更改InAsn xnSbn1-xnalloy。也可以通过改变阈值电压来改变阈值电压。

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