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Nanoscale polarization relaxation and piezoelectric properties of SBN thin films

机译:SBN薄膜的纳米尺度极化弛豫和压电性能

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摘要

Randomly oriented Sr0.75Ba0.25Nb2O6 thin films have been deposited on Pt(111)/Ti/SiO2/Si substrates using a polymeric chemical route to study their peculiar nanopolar structures and local ferroelectric properties using piezoresponse force microscopy (PFM) technique. PFM images reveals grains with contrast among fully white and fully black, a clear indication of non-zero polarization in the SBN films far above Tm ~ 221 K. Asymmetries observed in local hysteresis loops recorded at different grains suggest an imprint effect in the studied films due to an internal build-in electric field. Some grains show asymmetric hysteresis loops while other grains show symmetric hysteresis loops. The origin of the imprint effect observed in the SBN films is discussed in terms of complex defects associated to oxygen vacancies. The experimental relaxation curves were fitted using the Kohlrausch-Williams-Watts function. The time constant τ increases from 404 to 977 ms as the magnitude voltage increases.
机译:随机取向的Sr0.75Ba0.25Nb2O6薄膜已使用聚合化学途径沉积在Pt(111)/ Ti / SiO2 / Si衬底上,以利用压电响应力显微镜(PFM)技术研究其独特的纳米极性结构和局部铁电性能。 PFM图像显示出颗粒具有完全白色和完全黑色之间的对比度,这清楚地表明了远高于Tm〜221 K的SBN膜中的非零极化。在不同颗粒处记录的局部磁滞回线中观察到的不对称性表明,所研究的膜具有压印效果由于内部有内置电场。一些晶粒显示出不对称的磁滞回线,而其他晶粒显示出对称的磁滞回线。根据与氧空位有关的复杂缺陷,讨论了在SBN膜中观察到的压印效应的起源。使用Kohlrausch-Williams-Watts函数拟合实验松弛曲线。随着幅度电压的增加,时间常数τ从404增加到977 ms。

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