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Nucleation and growth domain limits in Ferroelectric polycrystalline thin films

机译:铁电多晶薄膜的成核和生长域限制

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Nowadays, polycrystalline Pb(Zr, Ti)O3 (PZT) thin films are widely used in various applications such as piezoelectric actuators, sensors and Ferroelectric Random Access Memory. In this later case an important issue is the switching speed capability at low voltage of the ferroelectric domains as well as their size. The switching speed control of nano-sized domain is mandatory for the application of ferroelectric nanostructures in new more efficient devices. In the last years, many studies have been done on the switching dynamics of epitaxial PZT ferroelectric thin films via Piezoresponse Force Microscopy (PFM). PFM is a powerful technique to study ferroelectric materials at the nanoscale level as the domain structures can be controlled in a non-destructive way and the orientation of the polarization can be studied locally. We report here the switching dynamic study in polycrystalline PZT thin films with two different thicknesses on a large time scale (from 1 s down to 10-9 s). Both films present a similar grain size (Rmean≈45 nm) and allowed the observations of two different regimes for the polarization switching speed. We could evidence a tight connection of the nucleation and growth of nano-domains as well as of their success rate with the film thickness and grain structure.
机译:如今,多晶Pb(Zr,Ti)O3(PZT)薄膜广泛用于各种应用中,例如压电致动器,传感器和铁电随机存取存储器。在后一种情况下,一个重要的问题是铁电畴在低压下的开关速度能力及其尺寸。纳米尺寸域的开关速度控制对于铁电纳米结构在新型更高效设备中的应用是必不可少的。近年来,已经通过压电响应力显微镜(PFM)对外延PZT铁电薄膜的转换动力学进行了许多研究。 PFM是研究纳米级铁电材料的一项强大技术,因为可以无损控制畴结构,并且可以局部研究极化方向。我们在这里报告了在较大的时间范围(从1 s到10-9 s)中具有两种不同厚度的多晶PZT薄膜的开关动力学研究。两种膜都具有相似的晶粒尺寸(Rmean≈45nm),并允许观察两种不同的偏振转换速度。我们可以证明纳米域的成核和生长以及其成功率与薄膜厚度和晶粒结构紧密相关。

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